Electrolytic Tough Pitch (ETP) Copper Plate for Industrial Fabrication
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Electrolytic Tough Pitch (ETP) Copper Plate for Industrial Fabrication

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The Workhorse of Industrial Copper​

ETP Copper (C11000) plates provide the optimal balance of conductivity (100% IACS), formability, and cost-effectiveness. With a controlled oxygen content of 0.02-0.04%, ETP copper develops protective oxide layers that resist hydrogen embrittlement – critical for

Power substation grounding grids

Chemical processing vessels

Architectural cladding systems

Heat exchanger baffle plates


​Fabrication Advantages​

  • •

    ​Weldability: Excellent results with TIG, MIG, and resistance welding

  • •

    ​Formability: 45% elongation allows deep drawing/stamping

  • •

    ​Corrosion Resistance: Patina formation protects against atmospheric corrosion

  • •

    ​Thermal Conductivity: 391 W/m·K at 20°C

​Available Dimensions​

Thickness (mm)

Width (mm)

Length (mm)

Surface Finish

6 - 50

1000 - 2500

2000 - 6000

Mill, Polished, Brushed

0.5 - 5

500 - 1500

1000 - 3000

Cold Rolled, Annealed

CONTACT US

If you have any queries, get in touch today! Don't hesitate. We try to take the extra step for our customer satisfaction.
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